基于全視場外差干涉的中心偏差測量技術(shù)研究
關(guān)鍵詞:外差干涉;干涉測量;中心偏差;裝調(diào)設(shè)備
中圖分類號:TH741 文獻(xiàn)標(biāo)識碼:A
Abstract:To meet the increasing demands for greater precision in measuring the centering error of optical lenses,this paper proposed a centering err measurement method based on ful-field heterodyne interferometry.This method used the actual optical axis of the test lens as the measurement reference,obtained the wavefront by measuring the interference fringes generated by the reflected beam of the measured lens and the reference beam,and performed Zernike polynomialfiting.The tilt coefficients of the Zernike polynomials were then converted into the centering error of the test lens,achieving high-precision measurementof the centering error and eliminating the reliance on an external rotational stage.Based on hetero dyne interference and centering error principle,the influence of laser intensity fluctuations and heterodyne frequency fluctuations on wavefront and decenter measurement results was analyzed. The results showed that measurement errors were positively correlated with laser intensity and heterodyne frequency fluctuations and were also afected by the curvature and decenter of the test lens.A decenter measurement system based on heterodyne interferometry was constructed,achieving high-precision decenter measurement, which was compared with simulation results. The simulation results show that the measurement accuracy of the system is not lessthan 0.06′′ ,and experimental results validated the simulations.The study indicates that,compared to traditional autocolimation-based decenter measurement methods,the heterodyne interferometry method can achieve higher measurement accuracy.
Key words: heterodyne interferometry; interferometry technology; centering eror; assembling apparatus
1引言
隨著科學(xué)技術(shù)的發(fā)展,光學(xué)系統(tǒng)已經(jīng)廣泛用于民用、工業(yè)檢測、醫(yī)療、科研等領(lǐng)域,精密光學(xué)儀器及對應(yīng)的光學(xué)系統(tǒng)結(jié)構(gòu)變得越來越復(fù)雜,例如遙感相機(jī)的口徑達(dá)到 300~500mm ,實(shí)現(xiàn)了0.1m 級的空間分辨率,光學(xué)零件作為主要部件對其精度的要求也越來越高[1]。(剩余12651字)
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- 光學(xué)精密工程
- 2025年08期
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